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Emerging lithographic technologies 10-11 March 1997, Santa Clara, California by

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Published by SPIE in Bellingham, Wash .
Written in English

Subjects:

  • Lithography, Electron beam -- Congresses.,
  • Electron beams -- Industrial applications -- Congresses.,
  • X-ray lithography -- Congresses.,
  • X-rays -- Industrial applications -- Congresses.,
  • Masks (Electronics) -- Congresses.

Book details:

Edition Notes

Includes bibliographical references and index.

StatementDavid E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
SeriesProceedings of SPIE ;, v. 3048, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 3048.
ContributionsSeeger, David E., Society of Photo-optical Instrumentation Engineers.
Classifications
LC ClassificationsTK7874 .E524 1997
The Physical Object
Paginationix, 412 p. :
Number of Pages412
ID Numbers
Open LibraryOL418388M
ISBN 100819424625
LC Control Number98122105
OCLC/WorldCa37533590

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