Cover of: Emerging lithographic technologies | Read Online

Emerging lithographic technologies 10-11 March 1997, Santa Clara, California by

  • 934 Want to read
  • ·
  • 16 Currently reading

Published by SPIE in Bellingham, Wash .
Written in English


  • Lithography, Electron beam -- Congresses.,
  • Electron beams -- Industrial applications -- Congresses.,
  • X-ray lithography -- Congresses.,
  • X-rays -- Industrial applications -- Congresses.,
  • Masks (Electronics) -- Congresses.

Book details:

Edition Notes

Includes bibliographical references and index.

StatementDavid E. Seeger, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.
SeriesProceedings of SPIE ;, v. 3048, Proceedings of SPIE--the International Society for Optical Engineering ;, v. 3048.
ContributionsSeeger, David E., Society of Photo-optical Instrumentation Engineers.
LC ClassificationsTK7874 .E524 1997
The Physical Object
Paginationix, 412 p. :
Number of Pages412
ID Numbers
Open LibraryOL418388M
ISBN 100819424625
LC Control Number98122105

Download Emerging lithographic technologies


Emerging-Lithographic-Technologies-Km What is a Adobe Portable Document Format Download Now: Manual Read E-Book Online at UAL meaning in the . Emerging Lithographic Technologies (Emerging Lithographic Technologies) Hardcover | SPIE-International Society for Optical Engine | Pub. Date: ISBN: | ISBN . PROCEEDINGS VOLUME Emerging Lithographic Technologies XI. Editor(s): Michael J. Lercel. For the purchase of this volume in printed format, please visit Volume Details. Volume . Emerging Lithographic Technologies IV. Editor(s): Elizabeth A. Dobisz Etching mm diameter SCALPEL masks with the ASE process Author(s): Ian R. Johnston; Huma Ashraf Resist .

Emerging lithographic technologies, such as stamping, are good candidates to solve these problems. But many of the tunnel junction processes require layer-to-layer alignment. And as we show, misalignment Author: F. Yesilkoy, C. Ropp, Z. Cummins, R. Probst, E. Waks, B. Shapiro, M. Peckerar. Emerging Library Technologies, is written for librarians/information professionals, teachers, administrators, researchers, undergraduate/graduate students, and others who are interested in . Proc. SPIE , Emerging Lithographic Technologies VI, pg 25 (1 July ); doi: / Read Abstract + The semiconductor industry has successfully undergone two major transitions in the . book chapters H. I. Smith, R. Menon, M. Walsh, and F. Zhang, “Zone-Plate-Array Lithography,” Book chapter in Emerging Lithographic Technologies for Nanopatterning, CRC Press/Taylor & Francis (in .

Emerging lithographic technologies IV: 28 February-1 March, , Santa Clara, USA. Other Authors. Dobisz, Elizabeth Ann, (Contributor.) Semiconductor Equipment and Materials International, (Content . Emerging-Lithographic-Technologies-Ig Adobe Acrobat Reader DCDownload Adobe Acrobat Reader DC Ebook PDF:The worlds best PDF solution lets you create sign and send documents on . Emerging Nanotechnologies for Manufacturing A volume in Micro and Nano Technologies. Book • Edited by: Non-Lithographic Techniques for Nanostructuring of Thin Films and Bulk Surfaces an . Emerging Technologies for Librarians: A Practical Approach to Innovation. focuses on the practical applications of emerging technologies in libraries, defining the technologies in the context of their use .